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The substrate is fabricated by depositing an Al-based insulating film on a copper substrate. AlN films were deposited by RF reactive sputtering using an Al target (5N) in a gas mixture of Ar and N-2. Al2O3 films were deposited by oxygen-ion-assisted electron beam (EB) evaporation. Many conductive paths were detected in the AlN films. These defects were introduced in the AlN film during a photolithography process for fabricating electrode patterns because the alkaline developer dissolved the film. An Al-OH peak in Fourier transform infrared spectroscopy (FT-IR) spectra suggested that the Al(OH)(3) formation was one of the reasons for the presence of conductive paths in the AlN film. In the case of Al2O3 films, no conducting path was detected in electrical measurements, and no marked change in surface morphology was observed in scanning electron microscopy (SEM) images, after treatment with the alkaline developer. The Al2O3/Cu structure is a candidate for the novel submount substrate with high thermal conductivity."}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Nakakuki, M"}], "nameIdentifiers": [{"nameIdentifier": "38753", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Shiono, A"}], "nameIdentifiers": [{"nameIdentifier": "38754", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kobayashi, I"}], "nameIdentifiers": [{"nameIdentifier": "38755", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Tajima, N"}], "nameIdentifiers": [{"nameIdentifier": "38756", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Yamakami, T"}], "nameIdentifiers": [{"nameIdentifier": "38757", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Hayashibe, R"}], "nameIdentifiers": [{"nameIdentifier": "38758", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Abe, K"}], "nameIdentifiers": [{"nameIdentifier": "38759", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kamimura, K"}], "nameIdentifiers": [{"nameIdentifier": "38760", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Obata, M"}], "nameIdentifiers": [{"nameIdentifier": "38761", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Miyamoto, M"}], "nameIdentifiers": [{"nameIdentifier": "38762", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2015-09-28"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "JJAP2.pdf", "filesize": [{"value": "1.4 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 1400000.0, "url": {"label": "JJAP2.pdf", "url": "https://soar-ir.repo.nii.ac.jp/record/12651/files/JJAP2.pdf"}, "version_id": "275247a5-1e07-4e30-a6e1-5e576484dc55"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Characterization of Al-based insulating films fabricated by physical vapor deposition", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Characterization of Al-based insulating films fabricated by physical vapor deposition", "subitem_title_language": "en"}]}, "item_type_id": "6", "owner": "1", "path": ["1222"], "permalink_uri": "http://hdl.handle.net/10091/1158", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2008-09-17"}, "publish_date": "2008-09-17", "publish_status": "0", "recid": "12651", "relation": {}, "relation_version_is_last": true, "title": ["Characterization of Al-based insulating films fabricated by physical vapor deposition"], "weko_shared_id": -1}
Characterization of Al-based insulating films fabricated by physical vapor deposition
http://hdl.handle.net/10091/1158
http://hdl.handle.net/10091/1158384e53ee-7d63-4b63-8cd0-fa8e22678850
名前 / ファイル | ライセンス | アクション |
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JJAP2.pdf (1.4 MB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2008-09-17 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Characterization of Al-based insulating films fabricated by physical vapor deposition | |||||
言語 | ||||||
言語 | eng | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1143/JJAP.47.609 | |||||
関連名称 | 10.1143/JJAP.47.609 | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
著者 |
Nakakuki, M
× Nakakuki, M× Shiono, A× Kobayashi, I× Tajima, N× Yamakami, T× Hayashibe, R× Abe, K× Kamimura, K× Obata, M× Miyamoto, M |
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信州大学研究者総覧へのリンク | ||||||
氏名 | Kamimura, K | |||||
URL | http://soar-rd.shinshu-u.ac.jp/profile/ja.yVkaZVkh.html | |||||
出版者 | ||||||
出版者 | INST PURE APPLIED PHYSICS | |||||
引用 | ||||||
内容記述タイプ | Other | |||||
内容記述 | JAPANESE JOURNAL OF APPLIED PHYSICS. 47(1):609-611(2008) | |||||
書誌情報 |
JAPANESE JOURNAL OF APPLIED PHYSICS 巻 47, 号 1, p. 609-611, 発行日 2008-01 |
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資源タイプ(コンテンツの種類) | ||||||
内容記述タイプ | Other | |||||
内容記述 | Article | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0021-4922 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA12295836 | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
WoS | ||||||
表示名 | Web of Science | |||||
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