@article{oai:soar-ir.repo.nii.ac.jp:00012652, author = {Kida, T and Nagasaka, Y and Sakurai, T and Yamakami, T and Hayashibe, R and Abe, K and Kamimura, K}, issue = {1}, journal = {JAPANESE JOURNAL OF APPLIED PHYSICS}, month = {Jan}, note = {Article, JAPANESE JOURNAL OF APPLIED PHYSICS. 47(1):566-568(2008)}, pages = {566--568}, title = {Growth and characterization of SiC films by hot-wire chemical vapor deposition at low substrate temperature using SiF4/CH4/H-2 mixture}, volume = {47}, year = {2008} }