@article{oai:soar-ir.repo.nii.ac.jp:00013015,
 author = {松本,  光功 and 小山,  安正},
 journal = {信州大学工学部紀要},
 month = {Jul},
 note = {The conditions for fabricating vacuum evaporated Mn-Bi thin films for optical memory element were studied. The method for preparation is that a layer of Bi is evaporated on the evaporated Mn films. These films are annealed in vacuum over a certain range of temperature. Measurements were made on X-ray diffraction and magnetic Faraday rotation. The most appropriate conditions for fabricating Mn-Bi thin films were found as follows, (1) Mica substrate is much more suitable than glass substrate. (2) In the processing of substrate, the cleaning in ultrasonic alcohol is effective. (3) Annealing temperature ranging from 280-300℃. (4) Annealing time for 72 hours. (5) Mol ratio of Mn/Bi of from 4-9., Article, 信州大学工学部紀要 30: 173-178 (1971)},
 pages = {173--178},
 title = {光メモリ用Mn-Bi合金薄膜の特性},
 volume = {30},
 year = {1971}
}