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CoFeSiO/SiO(2) Multilayer Granular Films With Very Narrow Ferromagnetic Resonant Linewidth
http://hdl.handle.net/10091/13523
http://hdl.handle.net/10091/13523f8e92a9f-e376-427b-80f0-fc6cb1258e2a
| 名前 / ファイル | ライセンス | アクション |
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CoFeSiO.pdf (511.8 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||
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| 公開日 | 2012-02-13 | |||||||||||
| タイトル | ||||||||||||
| タイトル | CoFeSiO/SiO(2) Multilayer Granular Films With Very Narrow Ferromagnetic Resonant Linewidth | |||||||||||
| 言語 | ||||||||||||
| 言語 | eng | |||||||||||
| DOI | ||||||||||||
| 関連識別子 | https://doi.org/10.1109/TMAG.2009.2023616 | |||||||||||
| 関連名称 | 10.1109/TMAG.2009.2023616 | |||||||||||
| キーワード | ||||||||||||
| 主題 | Ferromagnetic resonance (FMR), granular, linewidth, permeability | |||||||||||
| 資源タイプ | ||||||||||||
| 資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||
| タイプ | journal article | |||||||||||
| 著者 |
Ikeda, Kenji
× Ikeda, Kenji
× Suzuki, Toshimasa
× Sato, Toshiro
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| 信州大学研究者総覧へのリンク | ||||||||||||
| 氏名 | Sato, Toshiro | |||||||||||
| URL | http://soar-rd.shinshu-u.ac.jp/profile/ja.yNSNbpkh.html | |||||||||||
| 出版者 | ||||||||||||
| 出版者 | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | |||||||||||
| 引用 | ||||||||||||
| 内容記述 | IEEE TRANSACTIONS ON MAGNETICS. 45(10):4290-4293 (2009) | |||||||||||
| 書誌情報 |
IEEE TRANSACTIONS ON MAGNETICS 巻 45, 号 10, p. 4290-4293, 発行日 2009-10 |
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| 抄録 | ||||||||||||
| 内容記述 | In order to fabricate GHz-band micro-magnetic devices, we have investigated the high-frequency permeability of CoFeSiO/SiO multilayer granular films comprising alternate stacks of granular and insulator layers, which can enable us to control the magnetic grain size and intergrain spacing along the film thickness direction independent of each other. A very narrow ferromagnetic resonance (FMR) linewidth was obtained under specific film conditions. A sharp FMR peak was obtained for granular layer and insulator layer thicknesses of 6 and 1 nm, respectively. The CoFe/SiO(2) volume ratio of the granular layer has a strong influence on the FMR linewidth. A high CoFe/SiO(2) volume ratio resulted in a very narrow FMR linewidth. HR-TEM observation of a film with a high CoFe/SiO(2) volume ratio revealed a well-defined multilayer granular structure and a homogeneous CoFe grain size, which seem to be necessary for obtaining a very narrow FMR linewidth. The narrowest FMR linewidth observed in this study is 420 MHz, for an FMR frequency of 2.4 GHz, a permeability of 380, and a damping factor alpha of 0.007. | |||||||||||
| 資源タイプ（コンテンツの種類） | ||||||||||||
| ISSN | ||||||||||||
| 収録物識別子タイプ | ISSN | |||||||||||
| 収録物識別子 | 0018-9464 | |||||||||||
| 書誌レコードID | ||||||||||||
| 収録物識別子タイプ | NCID | |||||||||||
| 収録物識別子 | AA00667933 | |||||||||||
| 権利 | ||||||||||||
| 権利情報 | Copyright© 2009 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. | |||||||||||
| 出版タイプ | ||||||||||||
| 出版タイプ | AM | |||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||
| WoS | ||||||||||||
| URL | http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=ShinshuUniv&SrcApp=ShinshuUniv&DestLinkType=FullRecord&DestApp=WOS&KeyUT=000270149700227 | |||||||||||
