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Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition
http://hdl.handle.net/10091/13274
http://hdl.handle.net/10091/13274171dc6c0-dd18-4d3e-bc30-1766dc97b535
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||
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公開日 | 2011-10-24 | |||||||||||
タイトル | ||||||||||||
タイトル | Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition | |||||||||||
言語 | ||||||||||||
言語 | eng | |||||||||||
DOI | ||||||||||||
関連識別子 | https://doi.org/10.1149/1.3518414 | |||||||||||
関連名称 | 10.1149/1.3518414 | |||||||||||
資源タイプ | ||||||||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||||||||
タイプ | journal article | |||||||||||
著者 |
Arai, Susumu
× Arai, Susumu
× Suwa, Yoriyuki
× Endo, Morinobu
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信州大学研究者総覧へのリンク | ||||||||||||
氏名 | Arai, Susumu | |||||||||||
URL | http://soar-rd.shinshu-u.ac.jp/profile/ja.jUyhbpkh.html | |||||||||||
信州大学研究者総覧へのリンク | ||||||||||||
氏名 | Endo, Morinobu | |||||||||||
URL | http://soar-rd.shinshu-u.ac.jp/profile/ja.uUTmZhkh.html | |||||||||||
出版者 | ||||||||||||
出版者 | ELECTROCHEMICAL SOC INC | |||||||||||
引用 | ||||||||||||
内容記述 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY 158: D49-D53(2010) | |||||||||||
書誌情報 |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY 巻 158, 号 2, p. D49-D53, 発行日 2010-12-02 |
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抄録 | ||||||||||||
内容記述 | Cu/multiwalled carbon nanotube (MWCNT) composite plating by a pulse-reverse (PR) electrodeposition method was investigated in order to increase the MWCNT content of the composite plating films. The electrodeposition and dissolution behaviors of the composite films were investigated using scanning electron microscopy and X-ray diffraction to determine the most suitable electrodeposition and dissolution current densities for PR electrodeposition. PR electrodeposition of the Cu/MWCNT composite films was conducted by varying the current reverse ratios at the most suitable electrodeposition and dissolution current densities. The surface morphology of the Cu/MWCNT composite films after dissolution was significantly changed by variation of the anodic current densities. The MWCNT content of the composite films formed by PR electrodeposition was greater than that obtained using a direct current (dc) electrodeposition method, and reached a maximum value of 0.59 mass %, which is a 40% increase over that for dc electrodeposition. Furthermore, the surface roughness of the composite films fabricated by PR electrodeposition was less than that by dc electrodeposition. | |||||||||||
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ISSN | ||||||||||||
収録物識別子タイプ | ISSN | |||||||||||
収録物識別子 | 0013-4651 | |||||||||||
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収録物識別子タイプ | NCID | |||||||||||
収録物識別子 | AA00697016 | |||||||||||
権利 | ||||||||||||
権利情報 | Copyright (c) 2010 The Electrochemical Society | |||||||||||
出版タイプ | ||||||||||||
出版タイプ | VoR | |||||||||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||||
WoS | ||||||||||||
URL | http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=ShinshuUniv&SrcApp=ShinshuUniv&DestLinkType=FullRecord&DestApp=WOS&KeyUT=000285765600051 |
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Cite as
Arai, Susumu, Suwa, Yoriyuki, Endo, Morinobu, 2010, Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition: ELECTROCHEMICAL SOC INC, D49–D53 p.
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