ログイン
言語:

WEKO3

  • トップ
  • コミュニティ
  • ランキング
AND
To
lat lon distance
To

Field does not validate



インデックスリンク

インデックスツリー

メールアドレスを入力してください。

WEKO

One fine body…

WEKO

One fine body…

アイテム

{"_buckets": {"deposit": "7709436d-a930-477f-ab8d-a71c8a3ce727"}, "_deposit": {"id": "12481", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "12481"}, "status": "published"}, "_oai": {"id": "oai:soar-ir.repo.nii.ac.jp:00012481", "sets": ["1221:1222"]}, "author_link": ["38068", "38069", "38070"], "item_1628147817048": {"attribute_name": "\u51fa\u7248\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_6_biblio_info_6": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2010-12-02", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "2", "bibliographicPageEnd": "D53", "bibliographicPageStart": "D49", "bibliographicVolumeNumber": "158", "bibliographic_titles": [{"bibliographic_title": "JOURNAL OF THE ELECTROCHEMICAL SOCIETY"}]}]}, "item_6_description_20": {"attribute_name": "\u6284\u9332", "attribute_value_mlt": [{"subitem_description": "Cu/multiwalled carbon nanotube (MWCNT) composite plating by a pulse-reverse (PR) electrodeposition method was investigated in order to increase the MWCNT content of the composite plating films. The electrodeposition and dissolution behaviors of the composite films were investigated using scanning electron microscopy and X-ray diffraction to determine the most suitable electrodeposition and dissolution current densities for PR electrodeposition. PR electrodeposition of the Cu/MWCNT composite films was conducted by varying the current reverse ratios at the most suitable electrodeposition and dissolution current densities. The surface morphology of the Cu/MWCNT composite films after dissolution was significantly changed by variation of the anodic current densities. The MWCNT content of the composite films formed by PR electrodeposition was greater than that obtained using a direct current (dc) electrodeposition method, and reached a maximum value of 0.59 mass %, which is a 40% increase over that for dc electrodeposition. Furthermore, the surface roughness of the composite films fabricated by PR electrodeposition was less than that by dc electrodeposition.", "subitem_description_type": "Abstract"}]}, "item_6_description_30": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7\uff08\u30b3\u30f3\u30c6\u30f3\u30c4\u306e\u7a2e\u985e\uff09", "attribute_value_mlt": [{"subitem_description": "Article", "subitem_description_type": "Other"}]}, "item_6_description_31": {"attribute_name": "\u30d5\u30a9\u30fc\u30de\u30c3\u30c8\uff1amime\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_6_description_5": {"attribute_name": "\u5f15\u7528", "attribute_value_mlt": [{"subitem_description": "JOURNAL OF THE ELECTROCHEMICAL SOCIETY 158: D49-D53(2010)", "subitem_description_type": "Other"}]}, "item_6_link_3": {"attribute_name": "\u4fe1\u5dde\u5927\u5b66\u7814\u7a76\u8005\u7dcf\u89a7\u3078\u306e\u30ea\u30f3\u30af", "attribute_value_mlt": [{"subitem_link_text": "Arai, Susumu", "subitem_link_url": "http://soar-rd.shinshu-u.ac.jp/profile/ja.jUyhbpkh.html"}, {"subitem_link_text": "Endo, Morinobu", "subitem_link_url": "http://soar-rd.shinshu-u.ac.jp/profile/ja.uUTmZhkh.html"}]}, "item_6_link_67": {"attribute_name": "WoS", "attribute_value_mlt": [{"subitem_link_text": "Web of Science", "subitem_link_url": "http://gateway.isiknowledge.com/gateway/Gateway.cgi?\u0026GWVersion=2\u0026SrcAuth=ShinshuUniv\u0026SrcApp=ShinshuUniv\u0026DestLinkType=FullRecord\u0026DestApp=WOS\u0026KeyUT=000285765600051"}]}, "item_6_publisher_4": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "ELECTROCHEMICAL SOC INC"}]}, "item_6_relation_48": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_name": [{"subitem_relation_name_text": "10.1149/1.3518414"}], "subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.1149/1.3518414", "subitem_relation_type_select": "DOI"}}]}, "item_6_rights_62": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "Copyright (c) 2010 The Electrochemical Society"}]}, "item_6_select_64": {"attribute_name": "\u8457\u8005\u7248\u30d5\u30e9\u30b0", "attribute_value_mlt": [{"subitem_select_item": "publisher"}]}, "item_6_source_id_35": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0013-4651", "subitem_source_identifier_type": "ISSN"}]}, "item_6_source_id_39": {"attribute_name": "NII ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0013-4651", "subitem_source_identifier_type": "ISSN"}]}, "item_6_source_id_40": {"attribute_name": "\u66f8\u8a8c\u30ec\u30b3\u30fc\u30c9ID", "attribute_value_mlt": [{"subitem_source_identifier": "AA00697016", "subitem_source_identifier_type": "NCID"}]}, "item_6_text_70": {"attribute_name": "wosonly keywords", "attribute_value_mlt": [{"subitem_text_value": "COPPER ELECTRODEPOSITION; CORROSION BEHAVIOR; ORGANIC ADDITIVES; NM FEATURES; COATINGS; CHLORIDE; FIBERS; MATRIX; GROWTH; SPS"}]}, "item_6_textarea_68": {"attribute_name": "wosonly abstract", "attribute_value_mlt": [{"subitem_textarea_value": "Cu/multiwalled carbon nanotube (MWCNT) composite plating by a pulse-reverse (PR) electrodeposition method was investigated in order to increase the MWCNT content of the composite plating films. The electrodeposition and dissolution behaviors of the composite films were investigated using scanning electron microscopy and X-ray diffraction to determine the most suitable electrodeposition and dissolution current densities for PR electrodeposition. PR electrodeposition of the Cu/MWCNT composite films was conducted by varying the current reverse ratios at the most suitable electrodeposition and dissolution current densities. The surface morphology of the Cu/MWCNT composite films after dissolution was significantly changed by variation of the anodic current densities. The MWCNT content of the composite films formed by PR electrodeposition was greater than that obtained using a direct current (dc) electrodeposition method, and reached a maximum value of 0.59 mass %, which is a 40% increase over that for dc electrodeposition. Furthermore, the surface roughness of the composite films fabricated by PR electrodeposition was less than that by dc electrodeposition. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3518414] All rights reserved."}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Arai,  Susumu"}], "nameIdentifiers": [{"nameIdentifier": "38068", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Suwa,  Yoriyuki"}], "nameIdentifiers": [{"nameIdentifier": "38069", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Endo,  Morinobu"}], "nameIdentifiers": [{"nameIdentifier": "38070", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2015-09-28"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "Cu_Multiwalled_Carbon_Nanotube_Composite.pdf", "filesize": [{"value": "680.3 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 680300.0, "url": {"label": "Cu_Multiwalled_Carbon_Nanotube_Composite.pdf", "url": "https://soar-ir.repo.nii.ac.jp/record/12481/files/Cu_Multiwalled_Carbon_Nanotube_Composite.pdf"}, "version_id": "25bcf2fd-d6c2-4305-9c0d-eb5377fffa8e"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition", "subitem_title_language": "en"}]}, "item_type_id": "6", "owner": "1", "path": ["1221/1222"], "permalink_uri": "http://hdl.handle.net/10091/13274", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2011-10-24"}, "publish_date": "2011-10-24", "publish_status": "0", "recid": "12481", "relation": {}, "relation_version_is_last": true, "title": ["Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition"], "weko_shared_id": -1}
  1. 060 工学部
  2. 0601 学術論文

Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition

http://hdl.handle.net/10091/13274
171dc6c0-dd18-4d3e-bc30-1766dc97b535
名前 / ファイル ライセンス アクション
Cu_Multiwalled_Carbon_Nanotube_Composite.pdf Cu_Multiwalled_Carbon_Nanotube_Composite.pdf (680.3 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2011-10-24
タイトル
言語 en
タイトル Cu/Multiwalled Carbon Nanotube Composite Films Fabricated by Pulse-Reverse Electrodeposition
言語
言語 eng
資源タイプ
資源 http://purl.org/coar/resource_type/c_6501
タイプ journal article
著者 Arai, Susumu

× Arai, Susumu

WEKO 38068

Arai, Susumu

Search repository
Suwa, Yoriyuki

× Suwa, Yoriyuki

WEKO 38069

Suwa, Yoriyuki

Search repository
Endo, Morinobu

× Endo, Morinobu

WEKO 38070

Endo, Morinobu

Search repository
信州大学研究者総覧へのリンク
氏名 Arai, Susumu
URL http://soar-rd.shinshu-u.ac.jp/profile/ja.jUyhbpkh.html
信州大学研究者総覧へのリンク
氏名 Endo, Morinobu
URL http://soar-rd.shinshu-u.ac.jp/profile/ja.uUTmZhkh.html
出版者
出版者 ELECTROCHEMICAL SOC INC
引用
内容記述タイプ Other
内容記述 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 158: D49-D53(2010)
書誌情報 JOURNAL OF THE ELECTROCHEMICAL SOCIETY

巻 158, 号 2, p. D49-D53, 発行日 2010-12-02
抄録
内容記述タイプ Abstract
内容記述 Cu/multiwalled carbon nanotube (MWCNT) composite plating by a pulse-reverse (PR) electrodeposition method was investigated in order to increase the MWCNT content of the composite plating films. The electrodeposition and dissolution behaviors of the composite films were investigated using scanning electron microscopy and X-ray diffraction to determine the most suitable electrodeposition and dissolution current densities for PR electrodeposition. PR electrodeposition of the Cu/MWCNT composite films was conducted by varying the current reverse ratios at the most suitable electrodeposition and dissolution current densities. The surface morphology of the Cu/MWCNT composite films after dissolution was significantly changed by variation of the anodic current densities. The MWCNT content of the composite films formed by PR electrodeposition was greater than that obtained using a direct current (dc) electrodeposition method, and reached a maximum value of 0.59 mass %, which is a 40% increase over that for dc electrodeposition. Furthermore, the surface roughness of the composite films fabricated by PR electrodeposition was less than that by dc electrodeposition.
資源タイプ(コンテンツの種類)
内容記述タイプ Other
内容記述 Article
ISSN
収録物識別子タイプ ISSN
収録物識別子 0013-4651
書誌レコードID
収録物識別子タイプ NCID
収録物識別子 AA00697016
DOI
関連識別子
識別子タイプ DOI
関連識別子 https://doi.org/10.1149/1.3518414
関連名称
関連名称 10.1149/1.3518414
権利
権利情報 Copyright (c) 2010 The Electrochemical Society
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
WoS
表示名 Web of Science
URL http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=ShinshuUniv&SrcApp=ShinshuUniv&DestLinkType=FullRecord&DestApp=WOS&KeyUT=000285765600051
戻る
0
views
See details
Views

Versions

Ver.1 2021-03-01 11:26:10.498816
Show All versions

Share

Mendeley CiteULike Twitter Facebook Print Addthis

Cite as

Export

OAI-PMH
  • OAI-PMH JPCOAR
  • OAI-PMH DublinCore
  • OAI-PMH DDI
Other Formats
  • JSON
  • BIBTEX

Confirm


Powered by CERN Data Centre & Invenio


Powered by CERN Data Centre & Invenio