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{"_buckets": {"deposit": "2e5ec662-56ae-4a8b-8ac1-5208e6b3ca27"}, "_deposit": {"id": "13077", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "13077"}, "status": "published"}, "_oai": {"id": "oai:soar-ir.repo.nii.ac.jp:00013077", "sets": []}, "author_link": ["39925"], "item_10_biblio_info_6": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "1967-12-25", "bibliographicIssueDateType": "Issued"}, "bibliographicPageEnd": "103", "bibliographicPageStart": "97", "bibliographicVolumeNumber": "23", "bibliographic_titles": [{"bibliographic_title": "信州大学工学部紀要"}]}]}, "item_10_description_20": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "Amorphous Ge film, vacuum-evaporated on glass substrates, is known as a sort of semi-conductor. The present thesis is intended to investigate the influences of film thickness and impurities on its electrical resistivity as well as the temperature dependence of the resistivity, and following conclusions are drawn ; It (i.e., resistivity of amorphous Ge film) is independent of the thickness of the film within the range of 200-1000A. It is also independent of the vacuum ambients when film is produced in the vacuum of 10⁻⁹-10⁻⁷ Torr, though it grows higher when produced in 10⁻⁴ Torr owing to the incorporation of residual gases. It is rather insensitive to the addition of impurities such as Al, In and Sb below 1 atomic per cent. The temperature dependence of resistivity of pure, well-annealed amorphous Ge film was measured (below amorphous-crystalline transition temperature). And it is found that the activation energy for the electrical conduction amounts to 1.0 eV. This is to be interpreted in terms of the energy band gap broader than in the case of crystalline Ge.", "subitem_description_type": "Abstract"}]}, "item_10_description_30": {"attribute_name": "資源タイプ(コンテンツの種類)", "attribute_value_mlt": [{"subitem_description": "Article", "subitem_description_type": "Other"}]}, "item_10_description_31": {"attribute_name": "フォーマット:mimeタイプ", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_10_description_5": {"attribute_name": "引用", "attribute_value_mlt": [{"subitem_description": "信州大学工学部紀要 23: 97-103 (1967)", "subitem_description_type": "Other"}]}, "item_10_publisher_4": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "信州大学工学部"}]}, "item_10_select_64": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_select_item": "publisher"}]}, "item_10_source_id_35": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0037-3818", "subitem_source_identifier_type": "ISSN"}]}, "item_10_source_id_39": {"attribute_name": "NII ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0037-3818", "subitem_source_identifier_type": "ISSN"}]}, "item_10_source_id_40": {"attribute_name": "書誌レコードID", "attribute_value_mlt": [{"subitem_source_identifier": "AN00121228", "subitem_source_identifier_type": "NCID"}]}, "item_10_text_66": {"attribute_name": "sortkey", "attribute_value_mlt": [{"subitem_text_value": "05"}]}, "item_1627890569677": {"attribute_name": "出版タイプ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "伊東, 謙太郎", "creatorNameLang": "ja"}], "nameIdentifiers": [{"nameIdentifier": "39925", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2015-09-28"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "Engineering23-05.pdf", "filesize": [{"value": "408.9 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 408900.0, "url": {"label": "Engineering23-05.pdf", "url": "https://soar-ir.repo.nii.ac.jp/record/13077/files/Engineering23-05.pdf"}, "version_id": "caeccf06-25ed-45a5-bc00-b6a8a7863a42"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "departmental bulletin paper", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "非晶質 Ge 膜の電気的特質", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "非晶質 Ge 膜の電気的特質", "subitem_title_language": "ja"}, {"subitem_title": "Electrical Properties of Amorphous Ge\u0027 Films", "subitem_title_language": "en"}]}, "item_type_id": "10", "owner": "1", "path": ["1284"], "permalink_uri": "http://hdl.handle.net/10091/2882", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2009-03-30"}, "publish_date": "2009-03-30", "publish_status": "0", "recid": "13077", "relation": {}, "relation_version_is_last": true, "title": ["非晶質 Ge 膜の電気的特質"], "weko_shared_id": -1}
非晶質 Ge 膜の電気的特質
http://hdl.handle.net/10091/2882
http://hdl.handle.net/10091/2882d17c7c18-c3ac-4a26-a3a8-b3650c8c5bbe
名前 / ファイル | ライセンス | アクション |
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2009-03-30 | |||||
タイトル | ||||||
言語 | ja | |||||
タイトル | 非晶質 Ge 膜の電気的特質 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Electrical Properties of Amorphous Ge' Films | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | departmental bulletin paper | |||||
著者 |
伊東, 謙太郎
× 伊東, 謙太郎 |
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出版者 | ||||||
出版者 | 信州大学工学部 | |||||
引用 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 信州大学工学部紀要 23: 97-103 (1967) | |||||
書誌情報 |
信州大学工学部紀要 巻 23, p. 97-103, 発行日 1967-12-25 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Amorphous Ge film, vacuum-evaporated on glass substrates, is known as a sort of semi-conductor. The present thesis is intended to investigate the influences of film thickness and impurities on its electrical resistivity as well as the temperature dependence of the resistivity, and following conclusions are drawn ; It (i.e., resistivity of amorphous Ge film) is independent of the thickness of the film within the range of 200-1000A. It is also independent of the vacuum ambients when film is produced in the vacuum of 10⁻⁹-10⁻⁷ Torr, though it grows higher when produced in 10⁻⁴ Torr owing to the incorporation of residual gases. It is rather insensitive to the addition of impurities such as Al, In and Sb below 1 atomic per cent. The temperature dependence of resistivity of pure, well-annealed amorphous Ge film was measured (below amorphous-crystalline transition temperature). And it is found that the activation energy for the electrical conduction amounts to 1.0 eV. This is to be interpreted in terms of the energy band gap broader than in the case of crystalline Ge. | |||||
資源タイプ(コンテンツの種類) | ||||||
内容記述タイプ | Other | |||||
内容記述 | Article | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0037-3818 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AN00121228 | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 |