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放電による結晶整流器の表面処理に就いて
http://hdl.handle.net/10091/10894
http://hdl.handle.net/10091/1089443c16152-6ac8-42f9-b6fd-60433688a3ab
名前 / ファイル | ライセンス | アクション |
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2011-01-05 | |||||
タイトル | ||||||
言語 | ja | |||||
タイトル | 放電による結晶整流器の表面処理に就いて | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | THE SURFACE TREATMENT OF CRYSTAL RECTIFIBR BY GLOW DISCHARGE | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | departmental bulletin paper | |||||
著者 |
中野, 朝安
× 中野, 朝安 |
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出版者 | ||||||
出版者 | 信州大学工学部 | |||||
引用 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 信州大学工学部研究報告 3: 55-68(1954) | |||||
書誌情報 |
信州大学工学部研究報告 巻 3, p. 55-68, 発行日 1954-03-30 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | This paper deals with a new and very interesting technique by which the properties of p type silicon surface are altered very materially by bombardment with ions of such gases as nitrogen, air and argon, and with other semicondctor metarial such as. n type Si, p and n type Ge etc. This technique is reported by R. S. Ohl in Bell Laboratory about the same time 1952. My report is independant from his. Of course physical prinsiple is the same, but my technique by glow discharge is different in the point of several variables of experiment such as in velocity, intensity of bombarding current, length of time of bombardment, etc. My experimen-tal results are easier superior, and more satisfactory. This technique is only effective to p type Si, and not effective to other semiconductor material. From this results, we consider that ion bombardment produces the donor level by lattice defect in silicon. I could not understand the relativity of a particle and positive ion. | |||||
資源タイプ(コンテンツの種類) | ||||||
内容記述タイプ | Other | |||||
内容記述 | Article | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AN00121239 | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 |