WEKO3
アイテム
{"_buckets": {"deposit": "3479a57b-3937-4c6b-ae67-86dbdb194fc4"}, "_deposit": {"id": "19574", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "19574"}, "status": "published"}, "_oai": {"id": "oai:soar-ir.repo.nii.ac.jp:00019574", "sets": ["1222"]}, "author_link": ["105088", "105089"], "item_1628147817048": {"attribute_name": "出版タイプ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_6_biblio_info_6": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2015", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "4", "bibliographicPageStart": "04DD02", "bibliographicVolumeNumber": "54", "bibliographic_titles": [{"bibliographic_title": "JAPANESE JOURNAL OF APPLIED PHYSICS"}]}]}, "item_6_description_20": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "The dependence of spatial and statistical distribution of random telegraph noise (RTN) in a 30 nm NAND flash memory on channel doping concentration N-A and cell program state V-th is comprehensively investigated using three-dimensional Monte Carlo device simulation considering random dopant fluctuation (RDF). It is found that single trap RTN amplitude Delta V-th is larger at the center of the channel region in the NAND flash memory, which is closer to the jellium (uniform) doping results since N-A is relatively low to suppress junction leakage current. In addition, Delta V-th peak at the center of the channel decreases in the higher V-th state due to the current concentration at the shallow trench isolation (STI) edges induced by the high vertical electrical field through the fringing capacitance between the channel and control gate. In such cases, Delta V-th distribution slope. cannot be determined by only considering RDF and single trap. (C) 2015 The Japan Society of Applied Physics", "subitem_description_type": "Abstract"}]}, "item_6_description_30": {"attribute_name": "資源タイプ(コンテンツの種類)", "attribute_value_mlt": [{"subitem_description": "Article", "subitem_description_type": "Other"}]}, "item_6_description_5": {"attribute_name": "引用", "attribute_value_mlt": [{"subitem_description": "JAPANESE JOURNAL OF APPLIED PHYSICS. 54(4): 04DD02 (2015)", "subitem_description_type": "Other"}]}, "item_6_link_3": {"attribute_name": "信州大学研究者総覧へのリンク", "attribute_value_mlt": [{"subitem_link_text": "Miyaji, Kousuke", "subitem_link_url": "http://soar-rd.shinshu-u.ac.jp/profile/ja.yenpWFLa.html"}]}, "item_6_link_67": {"attribute_name": "WoS", "attribute_value_mlt": [{"subitem_link_text": "Web of Science", "subitem_link_url": "http://gateway.isiknowledge.com/gateway/Gateway.cgi?\u0026GWVersion=2\u0026SrcAuth=ShinshuUniv\u0026SrcApp=ShinshuUniv\u0026DestLinkType=FullRecord\u0026DestApp=WOS\u0026KeyUT=000357694000033"}]}, "item_6_publisher_4": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "IOP PUBLISHING LTD"}]}, "item_6_relation_48": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_name": [{"subitem_relation_name_text": "10.7567/JJAP.54.04DD02"}], "subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.7567/JJAP.54.04DD02", "subitem_relation_type_select": "DOI"}}]}, "item_6_rights_62": {"attribute_name": "権利", "attribute_value_mlt": [{"subitem_rights": "© 2015 The Japan Society of Applied Physics "}]}, "item_6_select_64": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_select_item": "author"}]}, "item_6_source_id_35": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0021-4922", "subitem_source_identifier_type": "ISSN"}]}, "item_6_source_id_39": {"attribute_name": "NII ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0021-4922", "subitem_source_identifier_type": "ISSN"}]}, "item_6_text_70": {"attribute_name": "wosonly keywords", "attribute_value_mlt": [{"subitem_text_value": "MOSFETS@@@FLUCTUATIONS@@@MODEL@@@TECHNOLOGY@@@SIMULATION@@@DESIGN@@@CMOS"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Tomita, Toshihiro"}], "nameIdentifiers": [{"nameIdentifier": "105088", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Miyaji, Kousuke"}], "nameIdentifiers": [{"nameIdentifier": "105089", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2018-03-09"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "Channel_doping_concentration_and_cell_program_state_dependence_on_random_telegraph_noise_spatial_and_statistical_distribution.pdf", "filesize": [{"value": "926.5 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensefree": "© 2015 The Japan Society of Applied Physics", "licensetype": "license_note", "mimetype": "application/pdf", "size": 926500.0, "url": {"label": "Channel_doping_concentration_and_cell_program_state_dependence_on_random_telegraph_noise_spatial_and_statistical_distribution.pdf", "url": "https://soar-ir.repo.nii.ac.jp/record/19574/files/Channel_doping_concentration_and_cell_program_state_dependence_on_random_telegraph_noise_spatial_and_statistical_distribution.pdf"}, "version_id": "7a849d4a-d1ee-4e6e-a247-bd963667ef3d"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Channel doping concentration and cell program state dependence on random telegraph noise spatial and statistical distribution in 30 nm NAND flash memory", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Channel doping concentration and cell program state dependence on random telegraph noise spatial and statistical distribution in 30 nm NAND flash memory", "subitem_title_language": "en"}]}, "item_type_id": "6", "owner": "1", "path": ["1222"], "permalink_uri": "http://hdl.handle.net/10091/00020335", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2018-03-09"}, "publish_date": "2018-03-09", "publish_status": "0", "recid": "19574", "relation": {}, "relation_version_is_last": true, "title": ["Channel doping concentration and cell program state dependence on random telegraph noise spatial and statistical distribution in 30 nm NAND flash memory"], "weko_shared_id": -1}
Channel doping concentration and cell program state dependence on random telegraph noise spatial and statistical distribution in 30 nm NAND flash memory
http://hdl.handle.net/10091/00020335
http://hdl.handle.net/10091/000203353b485166-1890-43cf-b2f1-b97b26e91d31
名前 / ファイル | ライセンス | アクション |
---|---|---|
![]() |
|
Item type | 学術雑誌論文 / Journal Article(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2018-03-09 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Channel doping concentration and cell program state dependence on random telegraph noise spatial and statistical distribution in 30 nm NAND flash memory | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
著者 |
Tomita, Toshihiro
× Tomita, Toshihiro× Miyaji, Kousuke |
|||||
信州大学研究者総覧へのリンク | ||||||
氏名 | Miyaji, Kousuke | |||||
URL | http://soar-rd.shinshu-u.ac.jp/profile/ja.yenpWFLa.html | |||||
出版者 | ||||||
出版者 | IOP PUBLISHING LTD | |||||
引用 | ||||||
内容記述タイプ | Other | |||||
内容記述 | JAPANESE JOURNAL OF APPLIED PHYSICS. 54(4): 04DD02 (2015) | |||||
書誌情報 |
JAPANESE JOURNAL OF APPLIED PHYSICS 巻 54, 号 4, p. 04DD02, 発行日 2015 |
|||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The dependence of spatial and statistical distribution of random telegraph noise (RTN) in a 30 nm NAND flash memory on channel doping concentration N-A and cell program state V-th is comprehensively investigated using three-dimensional Monte Carlo device simulation considering random dopant fluctuation (RDF). It is found that single trap RTN amplitude Delta V-th is larger at the center of the channel region in the NAND flash memory, which is closer to the jellium (uniform) doping results since N-A is relatively low to suppress junction leakage current. In addition, Delta V-th peak at the center of the channel decreases in the higher V-th state due to the current concentration at the shallow trench isolation (STI) edges induced by the high vertical electrical field through the fringing capacitance between the channel and control gate. In such cases, Delta V-th distribution slope. cannot be determined by only considering RDF and single trap. (C) 2015 The Japan Society of Applied Physics | |||||
資源タイプ(コンテンツの種類) | ||||||
内容記述タイプ | Other | |||||
内容記述 | Article | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0021-4922 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.7567/JJAP.54.04DD02 | |||||
関連名称 | 10.7567/JJAP.54.04DD02 | |||||
権利 | ||||||
権利情報 | © 2015 The Japan Society of Applied Physics | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
WoS | ||||||
表示名 | Web of Science | |||||
URL | http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=ShinshuUniv&SrcApp=ShinshuUniv&DestLinkType=FullRecord&DestApp=WOS&KeyUT=000357694000033 |