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Plasma Nitridation of 4H-SiC by Glow Discharge of N2/H2 Mixed Gases
http://hdl.handle.net/10091/00019228
http://hdl.handle.net/10091/0001922839b46291-512b-41ac-b6cd-d567883ca113
名前 / ファイル | ライセンス | アクション |
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Plasma_Nitridation_of_4H-SiC.pdf (316.2 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2016-10-14 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Plasma Nitridation of 4H-SiC by Glow Discharge of N2/H2 Mixed Gases | |||||
言語 | ||||||
言語 | eng | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.4028/www.scientific.net/MSF.821-823.504 | |||||
関連名称 | 10.4028/www.scientific.net/MSF.821-823.504 | |||||
キーワード | ||||||
主題 | Nitride, MIS, plasma, SiC | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
著者 |
Akahane, Yoshiyuki
× Akahane, Yoshiyuki× Kimura, Kyosuke× Kano, Takuo× Watanabe, Yukimune× Yamakami, Tomohiko× Fujimaki, Shinji× Kamimura, Kiichi |
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信州大学研究者総覧へのリンク | ||||||
氏名 | Kamimura, Kiichi | |||||
URL | http://soar-rd.shinshu-u.ac.jp/profile/ja.yVkaZVkh.html | |||||
出版者 | ||||||
出版者 | Trans Tech Publications | |||||
引用 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Materials Science Forum, Vols. 821-823, pp. 504-507 (2015) | |||||
書誌情報 |
Materials Science Forum 巻 821-823, p. 504-507, 発行日 2015-06 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The mixed gas of nitrogen and hydrogen was used for the plasma nitridation of SiC surface.A small amount of hydrogen was effective to activate the nitridation reaction and suppress the oxidationreaction. The interface properties were improved by using nitride layer as an interfacial bufferlayer of SiC MIS structure. | |||||
資源タイプ(コンテンツの種類) | ||||||
内容記述タイプ | Other | |||||
内容記述 | Article | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 1662-9752 | |||||
権利 | ||||||
権利情報 | © 2015 Trans Tech Publications, Switzerland | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |